AMAT MIRRA / MIRRA MESA High-performance CMP silicone membrane with Parylene coating
AMAT MIRRA / MIRRA MESA High-performance CMP silicone membrane with Parylene coating for enhanced reliability and tool stability. This advanced upgrade addresses critical CMP process control challenges by introducing a highly durable silicone membrane featuring precision Parylene coating technology. Designed for legacy and current AMAT MIRRA / MIRRA MESA platforms, this solution optimizes membrane lifetime, improves wafer handling consistency, and reduces particle generation in high-throughput CMP operations.
Eumetrys Spare Parts supplies this upgrade to fabs that demand both high reliability and proven performance. Backed by global field validation, our CMP membrane enhances clamping performance while remaining fully compatible with existing MIRRA head designs.
Key benefits
Replacement of OEM membrane with a new silicone or parylene-coated design, extending lifetime significantly
• Enhanced process reliability with stable pressure and uniform wafer handling throughout the CMP cycle
• Parylene coating option providing superior chemical resistance, no pinholes, constant thickness, and no thermal impact on the product
• Higher throughput and consistency thanks to injection molding technology, reducing variability linked to operator skill
• Reduced cost of ownership through longer usage time and fewer replacements
field results
Proven in mass production with more than 45,000 wafers processed without process issues during evaluation
• Significant improvement in wafer profile and process stability across oxide, tungsten, STI and Cu CMP steps
Enhanced sealing and durability with amat CMP membrane technology
This membrane upgrade is engineered for superior performance across a broad range of amat CMP applications. Using a liquid silicone rubber (LSR) compound injection molded in cleanroom environments, the membrane maintains uniform thickness, exceptional elasticity, and high thermal resistance.
The applied Parylene coating delivers added protection against chemical degradation and eliminates micro-pinhole risks commonly associated with conventional membrane surfaces. As a result, wafer backside contamination is significantly reduced while membrane longevity is extended well beyond conventional standards.
Designed for reliability on mirra CMP polish heads
The membrane is fully compatible with legacy and advanced mirra CMP platforms used in oxide, STI, and tungsten polish applications. It integrates seamlessly into the MIRRA head assembly without modification, preserving original compression dynamics and vacuum performance.
The parylene coating provides:
- Excellent barrier properties against slurry and chemical ingress
- Stable adhesion to the silicone body without delamination
- Uniform performance across thousands of wafer cycles
Fabs operating mirra CMP tool systems benefit from reduced maintenance interventions and more predictable membrane exchange schedules.
Benefits for fabs using amat cmp tools and legacy MIRRA platforms
Our membrane is specifically tailored for fabs using amat cmp tools that require high repeatability and reduced total cost of ownership. The cleanroom-grade manufacturing process guarantees zero foreign material intrusion during molding and curing, a critical requirement for advanced CMP operations.
Paired with statistical validation data and post-cure inspection, this membrane ensures optimal balance between mechanical compliance and chemical resistance. In oxide and barrier CMP steps where conditioning profiles vary significantly, this consistency becomes a key enabler of yield improvement.
Material science meets performance in cmp amat upgrades
This membrane represents a new standard in cmp amat consumables. Its dual-layer structure combines the elastic response of engineered silicone with the robustness of Parylene-C, enabling consistent pad pressure distribution and minimized membrane distortion during clamping.
Performance indicators include:
- Increased membrane service life up to 2x standard components
- Improved wafer profile uniformity
- Greater resistance to ozone, plasma, and abrasive slurries
These benefits translate directly into measurable process improvements and a more stable CMP process window across production lots.
Trusted membrane solution for amat mirra mesa cmp tools
Already deployed in production on multiple amat mirra mesa cmp tools, this membrane upgrade supports high-load and high-frequency polishing operations. Its design ensures fast response under vacuum and clamping cycles while preserving elasticity over extended periods of mechanical stress.
With real-world usage exceeding 40,000 wafers per cycle, it supports fabs in reducing membrane-related downtime and maintaining consistent wafer planarity.
Tailored compatibility for advanced cmp mirra mesa head assemblies
Engineered to work natively with cmp mirra mesa assemblies, this silicone membrane allows for direct replacement with minimal tool recalibration. The Parylene layer maintains integrity during heat cycling, ensuring long-term bonding and chemical resistance in demanding CMP conditions.
The upgrade package includes detailed installation instructions and is available with optional test data upon request.
Optimize performance with next-gen membrane technology
Upgrade your CMP process with the AMAT MIRRA / MIRRA MESA High-performance CMP silicone membrane with Parylene coating and gain measurable improvements in reliability, wafer protection, and membrane lifetime. Ideal for users of AMAT spare parts, this upgrade integrates into standard CMP platforms and supports even the most advanced semiconductor spare parts strategies.
Contact Eumetrys Spare Parts today to request technical specifications or receive a quote tailored to your CMP equipment roadmap.